3 rods CVD system

Preparation of nano materials,Various CVD experiment, Thin film growth of SiNx and SiO2,Passivation of semiconductor devices and integrated circuits


 
Key Features

3-rods-CVD
Technical Specification

Product Name

Three-channel gas CVD system

Chamber Length

440mm

Product Model

TI-O1200-80-3ZV10

Tube Diameter

80mm

Using Temperature

≦1100oC

Tube Length

1000mm

Temperature Accuracy

±1oC

Total Power

4.5KW

Temperature Control

Intelligent PID

Power Supply

220V 50/60Hz

Pre-storing Curve

Multi curves

Sealing Way

Vacuum Flange