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| Process Equipments : CVD (Thermal & Hot Wire) |
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Hot Filament or Hot Wire CVD System |
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| SP3 Model 650 Hot Filament CVD Reactor |
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Larger Usable Deposition Area— 14” X 15” (350mm X
375mm)
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2D and 3D Coatings— easily configured for planer or
complex shape coatings
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Excellent Film Uniformity— ±10% over 300mm
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High Production Capacity— fully accessible large
chamber size with 1/2 hour turnaround
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Low Cost Operation— < 0.4 kWh power consumption per
cubic mm of diamond deposited
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Computer-Controlled Deposition— consistent film
thickness and grain size for production; flexible
control of deposition for R&D
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Real Time Data Collection & Analysis— links to
multiple network protocols for remote monitoring &
analysis
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Thermal CVD Equipments |
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| (PROCESS SOLUTIONS FOR R&D TO LARGE-SCALE PRODUCTION OF SINGLE AND MULTI WALLED CARBON NANOTUBE
(SWCNT AND MWCNT, RESPECTIVELY), USING FIX BED METHOD) |
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| SP3 Model 650 Hot Filament CVD Reactor |
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Ready to use standard recipes for SWCNTs and MWCNTs
are provided with the system
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Customized recipes for SWCNTs and MWCNTs are made
available on request
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Furnaces with maximum operating temperature of 1200ºC,
with small to large heating zone lengths (optional)
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Additional accessories to directly insert the
Ferrocene/liquid carbon source
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Additional accessories to water-assist growth of
carbon nanotubes
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