PECVD With High Density

This System is PECVD With High Density and it used for SiO2 and R&D small scale production .


 
Special Feature

  • SiO2 PECVD system for R&D and small scale production
  • Excellent thickness and reflective index uniformity in deposited layer (ave. 7/1m)
  • Highly smooth surface (RMS roughness of deposited layer : 30.6A)
  • Transformer coupled high density plasma
  • Applications Optical waveguide Passivation layer
Single Spectrometer in India