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Microwave Plasma CVD
Systems
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(PROCESS SOLUTIONS FOR HIGHEST QUALITY DIAMOND
FILMS/VERTICALLY ALIGNED CARBON NANOTUBES) |
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1. Model
1.5 kW |
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Features
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Available with 1.5 kW or 3.0 kW
Microwave Power
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Semi-Auto and Manual Operation
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Equipped with Heated Stage
Including a Highly Reliable RF Induction Heater
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Pressure Operation Range 4-200 Torr
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Motorized z-axis Position
Control
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Thermal CVD
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Multi Diagnostic Ports
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In-situ
measurements of
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Nucleation and Film thickness (by pyrometer)
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Plasma Diagnostics (by emission spectroscopy)
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2. Model
AX5200-ECR |
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Features
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Available with 1.5 kW or 3.0Microwave Power
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Semi-Auto and Manual Operation
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Equipped with Heated Stage with a highly reliable RF
Induction Heater
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Multi Operational Mode
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ECR Remote or Local Plasma (1-100 mTorr)
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High Pressure Local Plasma (4-200 Torr)
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High and Controllable Radical Flux Densities
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Large Deposition Area
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Multi Diagnostic Ports
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Motorized z-axis Position Control
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In-situ
measurements of
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Nucleation and Film thickness (by pyrometer)
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Plasma Diagnostics (by emission spectroscopy)
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3.
Model 5.0 kW |
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Features
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Available With 5.0 kW Microwave Power
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Semi-Auto and Manual Operation
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Capable of Operating in High Power Density Plasma
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Equipped with Water Cooled Chamber & Stage
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Pressure Operation Range 10-200 Torr
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Motorized z-axis Position Control
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Multi Diagnostic Ports
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In-situ measurements of
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Nucleation and Film thickness (by pyrometer)
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Plasma Diagnostics (by emission spectroscopy)
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4.
Model 6.0 kW to 8.0 kW |
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Features
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Available With 5.0 kW Microwave Power
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Semi-Auto and Manual Operation
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Capable of Operating in High Power Density Plasma
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Equipped with Water Cooled Chamber & Stage
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Pressure Operation Range 10-200 Torr
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Motorized z-axis Position Control
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Multi Diagnostic Ports
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In-situ measurements of
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Nucleation and Film thickness (by pyrometer)
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Plasma Diagnostics (by emission spectroscopy)
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5.
Model AX6600 |
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Features
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Available with 100 kW Microwave Power
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Largest Area Microwave Plasma Source
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Computer Controlled Turn Key Operation
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Capable of Operating in Low to High Power Density
Plasmas
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Unique Capabilities of Temperature Control at High
Power Densities
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Equipped with Water Cooled Chamber & Stage
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Extremely Easy Access of Substrate and Inside Chamber
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Multi Diagnostic Ports
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In-situ measurements of
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Nucleation and Film thickness (by pyrometer)
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Plasma Diagnostics (by emission spectroscopy)
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